Substrate for a display apparatus including domain forming member disposed thereon

ABSTRACT

A substrate for a display apparatus includes a plate, a switching element, an insulating layer, and a partition wall. The plate has a reflection region on which a light that is provided from an exterior to the substrate is reflected and a transmission region through which a light generated from a backlight assembly passes. The switching element is on the plate. The insulating layer is on the plate having the switching element. The transmission region of the insulating layer is recessed when compared to the reflection region of the insulating layer. The insulating layer has a contact hole through which a first electrode of the switching element is partially exposed. The partition wall divides the transmission region into a plurality of transmission portions. Advantageously, an image display quality of the display apparatus is improved, and manufacturing cost is decreased.

CROSS-REFERENCE OF RELATED APPLICATIONS

This application is a continuation of and claims priority to U.S. patentapplication Ser. No. 11/871,780, filed on Oct. 12, 2007, which is acontinuation of and claims priority to U.S. application Ser. No.11/031,555, filed on Jan. 6, 2005 (now abandoned), which claims priorityfrom Korean Patent Application No. 2004-00701, filed on Jan. 6, 2004 andKorean Patent Application No. 2004-13337, filed on Feb. 27, 2004, thedisclosures of which are hereby incorporated herein by reference intheir entireties.

BACKGROUND

1. Field of the Invention

The present invention relates to a substrate for a display apparatus,and more particularly, the present invention relates to a substrate fora display apparatus having improved image display quality, including butnot limited to an improved viewing angle.

2. Description of the Related Art

In an LCD apparatus that is one of flat panel display (FPD) apparatuses,generally, liquid crystal arrangement varies in response to an electricfield applied to the liquid crystal, and thus a light transmittance ofthe liquid crystal may be changed to display an image.

The LCD apparatus displays the image using the liquid crystal havinganisotropy so that the anisotropy of the liquid crystal varies based ona direction of a light that passes through the liquid crystal. The imagedisplay quality is dependent on an angle of a viewpoint. In aconventional LCD apparatus, the range of the viewpoint angle isrestricted by image display quality deterioration. The viewpoint anglehaving a contrast ratio of more than about 10:1 is defined as a viewingangle limit/threshold of the LCD apparatus. The contrast ratio is aratio of a luminance of a dark image to a luminance of a bright image.When the LCD apparatus displays a darker image, and has more uniformluminance, the contrast ratio of the LCD apparatus increases.

The LCD apparatus may include a normally black mode and a black matrixhaving a decreased reflectivity so as to prevent the leakage of a lightand to display the darker image. When voltage is not applied to a commonelectrode and a pixel electrode of the LCD apparatus having the normallyblack mode, a black image is displayed. In order to make the luminanceuniform, the LCD apparatus includes a compensation film or a liquidcrystal layer having a multi-domain. A plurality of domains in theliquid crystal layer forms the multi-domain.

In order to improve the image display quality, liquid crystal moleculesmay have optimized optical characteristics. In addition, the LCDapparatus may have the multi-domain, a retardation film, etc.

The LCD apparatus of the multi-domain includes a vertical alignment (VA)mode, an in-plane switching (IPS) mode, etc. When an electric field isapplied to a liquid crystal layer of the LCD apparatus of themulti-domain, liquid crystal molecules of the liquid crystal layer arealigned in a plurality of directions so that the viewing angle of theLCD apparatus is increased.

A transmissive-reflective LCD apparatus includes a reflection region anda transmission region, and the transmissive-reflective LCD apparatusdisplays an image having good image display quality in a dark place or abright place. In general, the liquid crystal layer of the reflectionregion has different thickness from the liquid crystal layer of thetransmission region. The thickness of the liquid crystal layer isdetermined by a light path. A mobile display apparatus has the VA modeor the liquid crystal layer having the multi-domain to increase theviewing angle.

The transmissive-reflective LCD apparatus includes the retardation filmbetween a polarizer and the liquid crystal layer so that a light thathas passed through the polarizer is circularly polarized.

The light transmittance of the liquid crystal layer of thetransmissive-reflective LCD apparatus is determined by an angle of theliquid crystal with respect to a vertical direction of the liquidcrystal layer so that the transmissive-reflective LCD apparatus may bemanufactured without a rubbing process. However, when thetransmissive-reflective LCD apparatus is manufactured without therubbing process, a portion of the liquid crystal layer corresponding toa central portion of the transmission region may be misaligned so thatthe image display quality of the LCD apparatus is lowered. Inparticular, a stepped portion is formed at an interface between thereflection region and the transmission region so that a portion of theliquid crystal layer adjacent to the stepped portion is aligned alongthe interface. In contrast, the portion of the liquid crystal layercorresponding to the central portion of the transmission region may notbe aligned along the interface.

When the transmissive-reflective LCD apparatus is manufactured throughthe rubbing process, manufacturing cost of transmissive-reflective LCDapparatus is increased. In addition, the LCD apparatus may benon-uniformly rubbed so that the image display quality of the LCDapparatus is deteriorated.

BRIEF SUMMARY

The present invention provides a substrate for a display apparatushaving improved image display quality.

The present invention also provides a display apparatus having thesubstrate.

The present invention also provides a method of manufacturing thesubstrate for the display apparatus.

The present invention also provides a method of manufacturing thedisplay apparatus.

The present invention also provides a color filter substrate capable ofimproving a viewing angle and an image display quality.

The present invention also provides a liquid crystal display (LCD)apparatus having the substrate.

The present invention also provides a method of manufacturing the colorfilter substrate.

The present invention also provides a method of manufacturing the LCDapparatus.

A substrate for a display apparatus in accordance with an aspect of thepresent invention includes a plate, a switching element, an insulatinglayer, and a partition wall. The plate has a reflection region fromwhich a light that is provided from an exterior to the substrate isreflected and a transmission region through which a light generated froma backlight assembly passes. The switching element is on the plate. Theinsulating layer is on the plate having the switching element. Thetransmission region of the insulating layer is recessed when compared tothe reflection region of the insulating layer. The insulating layerincludes a contact hole through which a first electrode of the switchingelement is partially exposed. The partition wall divides thetransmission region into a plurality of transmission portions.

A substrate for a display apparatus in accordance with another aspect ofthe present invention includes a plate, a switching element, a firstpixel electrode portion, an insulating layer, a second pixel electrodeportion, and a partition wall. The switching element is on the plate.The first pixel electrode portion is on the plate having the switchingelement. The insulating layer is on the plate having the switchingelement and the first pixel electrode portion. The insulating layerincludes a contact hole through which a first electrode of the switchingelement is partially exposed and an opening through which the firstpixel electrode portion is partially exposed. The second pixel electrodeportion is on the insulating layer. The second pixel electrode portionis electrically connected to the first electrode of the switchingelement and the first pixel electrode portion. The partition wall is onthe first pixel electrode portion to divide the exposed first pixelelectrode portion that is exposed through the opening of the insulatinglayer into a plurality of transmission portions.

A substrate for a display apparatus in accordance with still anotheraspect of the present invention includes a plate, a switching element,an insulating layer, a partition wall and a pixel electrode. The platehas a reflection region from which a light that is provided from anexterior to the substrate is reflected and a transmission regionadjacent to the reflection region. The switching element is on theplate. The insulating layer is on the plate having the switchingelement. The transmission region of the insulating layer is recessedwhen compared to the reflection region of the insulating layer. Theinsulating layer includes a contact hole through which a first electrodeof the switching element is partially exposed. The partition wall is onthe plate having the switching element to divide the transmission regioninto a plurality of transmission portions. The pixel electrode is on theinsulating layer so that the pixel electrode is electrically connectedto the first electrode of the switching element.

A display apparatus having the substrate in accordance with an aspect ofthe present invention includes a lower substrate and an upper substrate.The lower substrate includes a first plate, a switching element, aninsulating layer, and a partition wall. The first plate has a reflectionregion from which a light that is provided from an exterior to the lowersubstrate is reflected and a transmission region adjacent to thereflection region. The switching element is on the first plate. Theinsulating layer is on the plate having the switching element. Thetransmission region of the insulating layer is recessed when compared tothe reflection region of the insulating layer. The insulating layerincludes a contact hole through which a first electrode of the switchingelement is partially exposed. The partition wall divides thetransmission region into a plurality of transmission portions. The uppersubstrate includes a second plate and a common electrode on the secondplate. The upper substrate corresponds to the lower substrate. Thecommon electrode has at least one pattern of the transmission portions.

A display apparatus having the substrate in accordance with anotheraspect of the present invention includes a lower substrate and an uppersubstrate. The lower substrate includes a first plate, a switchingelement, a first pixel electrode portion, an insulating layer, a secondpixel electrode portion and a partition wall. The switching element ison the first plate. The first pixel electrode portion is on the firstplate having the switching element. The insulating layer is on the firstplate having the switching element and the first pixel electrodeportion. The insulating layer includes a contact hole through which afirst electrode of the switching element is partially exposed and anopening through which the first pixel electrode portion is partiallyexposed. The second pixel electrode portion is on the insulating layer.The second pixel electrode portion is electrically connected to thefirst electrode of the switching element and the first pixel electrodeportion. The partition wall is on the first pixel electrode portion todivide the exposed first pixel electrode portion that is exposed throughthe opening of the insulating layer into a plurality of transmissionportions. The upper substrate includes a second plate and a commonelectrode on the second plate. The upper substrate corresponds to thelower substrate. The common electrode has a pattern corresponding to oneof the transmission portions.

A display apparatus having the substrate in accordance with stillanother aspect of the present invention includes a lower substrate andan upper substrate. The lower substrate includes a first plate, aswitching element, an insulating layer, a partition wall and a pixelelectrode. The first plate has a reflection region from which a lightthat is provided from an exterior to the lower substrate is reflectedand a transmission region adjacent to the reflection region. Theswitching element is on the first plate. The insulating layer is on thefirst plate having the switching element. The transmission region of theinsulating layer is recessed when compared to the reflection region ofthe insulating layer. The insulating layer includes a contact holethrough which a first electrode of the switching element is partiallyexposed. The partition wall is on the first plate having the switchingelement to divide the transmission region into a plurality oftransmission portions. The pixel electrode is on the insulating layer sothat the pixel electrode is electrically connected to the firstelectrode of the switching element. The upper substrate includes asecond plate and a common electrode on the second plate. The uppersubstrate corresponds to the lower substrate. The common electrode has apattern corresponding to one of the transmission portions.

A method of manufacturing a substrate for a display apparatus inaccordance with an aspect of the present invention is provided asfollows. A switching element is formed on a plate. A first pixelelectrode part is formed on the plate having the switching element. Aninsulating layer is formed on the plate having the switching element andthe first pixel electrode part. The insulating layer has a contact holethrough which a first electrode of the switching element is partiallyexposed and an opening through which the first pixel electrode part ispartially exposed. A partition wall is formed to divide the exposedportion of the first pixel electrode part that is exposed through theopening into a plurality of transmission portions. A second pixelelectrode part is formed on the insulating layer. The second pixelelectrode part is electrically connected to the first electrode and thefirst pixel electrode part.

A method of manufacturing a substrate for a display apparatus inaccordance with another aspect of the present invention is provided asfollows. A switching element is formed on a plate having a reflectionregion from which a light that is provided from an exterior to thesubstrate is reflected, and a transmission region adjacent to thereflection region. An insulating layer is formed on the plate having theswitching element. The transmission region of the insulating layer isrecessed when compared to the reflection region of the insulating layer.The insulating layer has a contact hole through which a first electrodeof the switching element is partially exposed. A partition wall isformed in the transmission region to divide the transmission region intoa plurality of transmission portions. A second pixel electrode part isformed on the insulating layer. The second pixel electrode part iselectrically connected to the first electrode and the first pixelelectrode part.

A method of manufacturing a display apparatus in accordance with anaspect of the present invention is provided as follows. A switchingelement is formed on a first plate having a reflection region from whicha light that is provided from an exterior to the first plate isreflected and a transmission region adjacent to the reflection region.An insulating layer is formed on the first plate having the switchingelement. The transmission region of the insulating layer is recessedwhen compared to the reflection region of the insulating layer. Theinsulating layer has a contact hole through which a first electrode ofthe switching element is partially exposed. A partition wall is formedin the transmission region to divide the transmission region into aplurality of transmission portions. A common electrode is formed on asecond plate. The common electrode has a pattern corresponding to one ofthe transmission portions.

A color filter substrate in accordance with an aspect of the presentinvention includes a transparent plate, a color filter and a commonelectrode. The transparent plate includes a display region and aperipheral region that surrounds the display region. The color filter ison the transparent plate corresponding to the display region. The colorfilter has a recess for a multi-domain in the display region. The commonelectrode is on the peripheral region of the transparent plate, thecolor filter and an inner surface of the recess for the multi-domain toform a distorted electric field adjacent to the recess for themulti-domain.

An LCD apparatus in accordance with an aspect of the present inventionincludes a second plate, a color filter, a common electrode, a firstplate, a pixel electrode and a liquid crystal layer. The second plateincludes a display region and a peripheral region that surrounds thedisplay region. The color filter is on the second plate corresponding tothe display region. The color filter has a recess for a multi-domain inthe display region. The common electrode is on the peripheral region ofthe second plate, the color filter and an inner surface of the recessfor the multi-domain to form a distorted electric field adjacent to therecess for the multi-domain. The first plate includes a pixel regioncorresponding to the display region and a switching element in the pixelregion. The pixel electrode is in the pixel region of the first plate.The pixel electrode is electrically connected to an electrode of theswitching element. The liquid crystal layer is between the pixelelectrode and the common electrode.

A method of manufacturing a color filter substrate in accordance with anaspect of the present invention is provided as follows. An organicmaterial having a predetermined color is coated on a transparent platehaving a display region and a peripheral region that surrounds thedisplay region. A portion of the coated organic material is removed toform a color filter in the display region. The color filter has a recessfor a multi-domain. A transparent insulating material is on thetransparent plate having the color filter to form a common electrodethat forms a distorted electric field adjacent to the recess for themulti-domain.

A method of manufacturing the LCD apparatus in accordance with an aspectof the present invention is provided as follows. An organic materialhaving a predetermined color is coated on a second plate having adisplay region and a peripheral region that surrounds the displayregion. A portion of the coated organic material is removed to form acolor filter in the display region, the color filter having a recess fora multi-domain. A transparent insulating material is deposited on thesecond plate having the color filter to form a common electrode thatforms a distorted electric field adjacent to the recess for themulti-domain. A switching element and a pixel electrode that iselectrically connected to an electrode of the switching element areformed in a pixel region of a first plate that corresponds to the secondplate. The pixel region corresponds to the display region. A liquidcrystal layer is formed between the pixel electrode and the commonelectrode.

The transmission region includes a transmission window.

Therefore, the display apparatus includes a liquid crystal layer havinga vertical alignment (VA) mode and the multi-domain so that the imagedisplay quality of the display apparatus is improved. The liquid crystallayer having the VA mode may be inclined by a predetermined pretiltangle. In addition, the display apparatus may be manufactured without arubbing process. In particular, the liquid crystal layer includes themulti-domain so that the viewing angle of the LCD apparatus is improved.Furthermore, a manufacturing process of the display apparatus issimplified so that a manufacturing cost of the display apparatus isdecreased.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other advantages of the present invention will become moreapparent by describing in detail embodiments thereof with reference tothe accompanying drawings, in which:

FIG. 1A is a plan view showing a lower substrate of a display apparatusin accordance with an embodiment of the present invention;

FIG. 1B is a plan view showing a lower substrate of a display apparatusin accordance with another embodiment of the present invention;

FIG. 2A is a cross-sectional view taken along the line I-I′ shown inFIG. 1A;

FIG. 2B is a cross-sectional view taken along the line II-II′ shown inFIG. 1B;

FIGS. 3A to 3C are cross-sectional views showing a method ofmanufacturing the lower substrate shown in FIG. 2A;

FIG. 4A is a plan view showing a display apparatus in accordance withanother embodiment of the present invention;

FIG. 4B is a plan view showing a display apparatus in accordance withanother embodiment of the present invention;

FIG. 4C is a plan view showing a display apparatus in accordance withanother embodiment of the present invention;

FIG. 5A is a cross-sectional view taken along the line III-III′ shown inFIG. 4A;

FIG. 5B is a cross-sectional view taken along the line IV-IV′ shown inFIG. 4B;

FIG. 5C is a cross-sectional view taken along the line V-V′ shown inFIG. 4C;

FIG. 6 is a plan view showing an LCD apparatus in accordance with anembodiment of the present invention;

FIG. 7 is a cross-sectional view taken along the line VI-VI′ shown inFIG. 6;

FIG. 8 is a cross-sectional view taken along the line VII-VII′ shown inFIG. 6;

FIGS. 9A to 9K are cross-sectional views showing a method ofmanufacturing the LCD apparatus shown in FIG. 6;

FIG. 10 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention;

FIG. 11 is a plan view showing a first pixel electrode part and a secondpixel electrode part shown in FIG. 10;

FIG. 12 is a cross-sectional view taken along the line VIII-VIII′ shownin FIG. 10;

FIG. 13 is a cross-sectional view taken along the line IX-IX′ shown inFIG. 10;

FIGS. 14A to 14J are cross-sectional views showing a method ofmanufacturing the LCD apparatus shown in FIG. 10;

FIG. 15 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention;

FIG. 16 is a cross-sectional view taken along the line X-X′ shown inFIG. 15;

FIG. 17 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention;

FIG. 18 is a plan view showing a first pixel electrode part and a secondpixel electrode part shown in FIG. 17;

FIG. 19 is a cross-sectional view taken along the line XI-XI′ shown inFIG. 17;

FIG. 20 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention;

FIG. 21 is a cross-sectional view taken along the line XII-XII′ shown inFIG. 20;

FIG. 22 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention; and

FIG. 23 is a cross-sectional view taken along the line XIII-XIII′ shownin FIG. 22.

DETAILED DESCRIPTION

It should be understood that the embodiments of the present inventiondescribed below may be modified in many different ways without departingfrom the inventive principles disclosed herein, and the scope of thepresent invention is therefore not limited to these particular followingembodiments. Rather, these embodiments are provided so that thisdisclosure will be thorough and complete, and will fully convey theconcept of the invention to those skilled in the art by way of exampleand not of limitation.

Hereinafter, the present invention will be described in detail withreference to the accompanying drawings.

FIG. 1A is a plan view showing a lower substrate of a display apparatusin accordance with an embodiment of the present invention. FIG. 1B is aplan view showing a lower substrate of a display apparatus in accordancewith another embodiment of the present invention.

Referring to FIGS. 1A and 1B, the lower substrate includes a switchingelement 215, a gate line 203′ that is electrically connected to theswitching element 215, a data line 211′ that is electrically connectedto the switching element 215, a pixel area Px, and a pixel electrode inthe pixel area Px. The switching element 215 includes a gate electrode203, a first electrode 211, and a second electrode 213. The pixel areaPx includes a reflection region Ra and a transmission region Ta.Referring to FIG. 1A, the transmission region Ta is divided into twotransmission portions Ta′ by a partition wall 223. Alternatively, thetransmission region Ta may be divided into four transmission portionsTa″ by a plurality of partition walls 223 as shown in FIG. 1B. In theseembodiments, the transmission portions have substantially equal areas toone another. Alternatively, the transmission portions may have differentareas from one another. An embossed portion is formed on the reflectionregion Ra in one example. The pixel electrode includes a first pixelelectrode part 219 and a second pixel electrode part 225 (FIG. 2A).

A driving integrated circuit (IC) outputs a selection signal to the gateelectrode 203 through the gate line 203′, and the driving IC outputs adata voltage to the pixel electrode through the data line 211′ and theswitching element 215.

The lower substrate is combined with an upper substrate (not shown) sothat a liquid crystal layer (not shown) is interposed between the lowersubstrate and the upper substrate (not shown) to form a displayapparatus. The upper substrate (not shown) includes a color filter (notshown), a common electrode (not shown), etc. Alternatively, the commonelectrode (now shown) may include a pattern. The liquid crystal layer(not shown) may include a vertical alignment (VA) mode, a reversetwisted nematic (RTN) mode, etc.

FIG. 2A is a cross-sectional view taken along the line I-I′ shown inFIG. 1A. FIG. 2B is a cross-sectional view taken along the line II-II′shown in FIG. 1B.

Referring to FIG. 2A, the first pixel electrode part 219 is under thepartition wall 223. The switching element 215 and the first pixelelectrode part 219 are on a first plate 201. The partition wall 223, aninsulating layer 221 in which the transmission region Ta is opened, andthe second pixel electrode part 225 are on the first plate 201 havingthe switching element 215 and the first pixel electrode part 219. Thefirst pixel electrode part 219 is in the transmission region Ta, and thesecond pixel electrode part 225 is in the reflection region Ra.

That is, the lower substrate includes the first plate 201, the switchingelement 215, the first pixel electrode part 219, the insulating layer221, and a second pixel electrode part 225. The switching element 215 ison the first plate 201. The first pixel electrode part 219 is over aremaining portion of the first plate 201 on which the switching element215 is not formed. The insulating layer 221 is over the first plate 201having the switching element 215 and the first pixel electrode part 219.The first electrode 213 of the switching element 215 and the first pixelelectrode part 219 are partially exposed through openings of theinsulating layer 221. The partition wall 223 is formed from a same layeras the insulating layer 221. The second pixel electrode part 225 is onthe insulating layer 221 so that the second pixel electrode part 225 iselectrically connected to the first electrode 213 of the switchingelement 215 and the first pixel electrode part 219.

The transmission region Ta may have a variety of shapes, including butnot limited to a circular shape, a polygonal shape, and an ellipticalshape. The polygonal shape may include a quadrangular shape, a hexagonalshape, and an octagonal shape, in one example.

The first and second pixel electrodes 219 and 225 may have amono-layered structure, a double-layered structure, etc. In thisembodiment, a passivation layer 217 is between the switching element 215and the insulating layer 221. The first pixel electrode part 219 is atransparent electrode having indium tin oxide (ITO) or indium zinc oxide(IZO) in one example, and the second pixel electrode part 225 is anopaque electrode having aluminum, or aluminum alloy in another example.The second pixel electrode part 225 may have a multi-layered structureincluding an aluminum layer. An alloy layer having molybdenum, tungsten,etc., may be formed between the first and second pixel electrode parts219 and 225.

The partition wall 223 has a material that is substantially similar tothe insulating layer 221.

Referring to FIG. 2B, the first pixel electrode part 219 is arranged onthe partition walls 223. The lower substrate of FIG. 2B is substantiallythe same as in FIG. 2A except for the first and second pixel electrodeparts 219 and 225. The first pixel electrode part 219 is arranged on theinsulating layer 221, and the second pixel electrode part 225 isarranged on the first pixel electrode part 219. In addition, the firstpixel electrode part 219 is formed on the partition walls 223.

According to this embodiment, a stepped portion is formed at aninterface between the reflection region Ra and the transmission regionTa, and the partition wall 223 is formed in the transmission region Taso that the liquid crystal layer (not shown) may be aligned along theinterface and the partition wall 223 when voltage is not applied to thepixel electrode. Therefore, although a rubbing process is omitted, theliquid crystal layer (not shown) corresponding to a central portion ofthe transmission region Ta is aligned so that the image display qualityof the display apparatus is improved. In addition, as the lowersubstrate is manufactured without the rubbing process, the manufacturingcost of the lower substrate is decreased while yield of the lowersubstrate is increased.

FIGS. 3A to 3C are cross-sectional views showing a method ofmanufacturing the lower substrate shown in FIG. 2A.

Referring to FIG. 3A, the switching element 215 is formed on the firstplate 201. The first pixel electrode part 219 is formed on the remainingportion of the first plate 201 on which the switching element 215 is notformed. The insulating layer 221′ is formed on the first plate 201having the switching element 215 and the first pixel electrode part 219.

The first plate 201 is comprised of a transparent material such asglass, quartz, etc. The first plate 201 is an insulator. The switchingelement 215 includes a thin film transistor (TFT). The switching element215 has a gate electrode 203, a gate insulating layer 205, a channellayer 207, the first electrode 211′ that is a drain electrode, and thesecond electrode 213 that is a source electrode. Alternatively, thefirst electrode may be the source electrode, and the second electrodemay be the drain electrode. Each of the gate electrode 203, the firstelectrode 211, and the second electrode 213 has a metallic thin film,and may include a multi-layered thin film having metals such asaluminum. Each of the gate electrode 203, the first electrode 211, andthe second electrode 213 may be formed through a sputtering process inone example. The gate insulating layer 205 includes an insulatingmaterial such as silicon nitride, silicon oxide, etc. The channel layer207 is a semiconductor layer such as a silicon layer. Each of the gateinsulating layer 205 and the channel layer 207 may be formed through achemical vapor deposition (CVD) method in one example.

The gate electrode 203 and the gate line 203′ shown in FIG. 1A areformed on the first plate 201. The gate insulating layer 205 is formedon the first plate 201 having the gate electrode 203 and the gate line203′. The semiconductor layer and an ohmic contact layer are formed onthe gate insulating layer 205. The semiconductor layer and the ohmiccontact layer are partially patterned to form a semiconductor patternand an ohmic contact pattern. A metal layer (not shown) is formed on thefirst plate 201 having the ohmic contact pattern. The metal layer (notshown) is partially patterned to form the first electrode 211, thesecond electrode 213, and the data line 211′ (FIG. 1A). The first andsecond electrodes 211 and 213 correspond to the gate electrode 203, andthe first electrode 211 is spaced apart from the second electrode 213.

The ohmic contact pattern between the first and second electrodes 211and 213 is etched by using the first and second electrodes 211 and 213as an etching mask to form the channel layer 207, thereby forming theswitching element 215. Alternatively, the semiconductor layer (notshown), the ohmic contact layer (not shown), and the metal layer (notshown) are deposited and patterned to form the first and secondelectrodes, and the ohmic contact pattern between the first and secondelectrodes is etched to form the switching element 215. The passivationlayer 217 is formed on the switching element 215. The passivation layer217 may include an insulating material such as silicon nitride in oneexample.

A transparent insulating material is coated on the passivation layer217. In this embodiment, the transparent insulating material includesorganic material so that the insulating layer 221′ has a lowerdielectric constant than the gate insulating layer 205 or thepassivation layer 217. In addition, the insulating layer 221 is thickerthan the gate insulating layer 205 or the passivation layer 217.Furthermore, the insulating layer 221′ has a flat surface.

Referring to FIG. 3B, a reticle 300 of an exposure unit is prepared sothat the coated organic material of insulating layer 221′ shown in FIG.3A is partially exposed through the reticle 300. That is, a portion ofthe coated organic material of insulating layer 221′ corresponding to aportion of the second electrode 213 and a portion of the transmissionregion Ta are opened, and a remaining portion of the transmission regionTa corresponding to the partition wall 223 is blocked by the reticle300. Thus, the insulating layer 221 is formed.

In this embodiment, the organic material includes photosensitivematerial so that the insulating layer 221 is formed through a photoprocess including an exposure process and a development process.Alternatively, the insulating layer 221 may be formed through aphotolithography process.

When a light is irradiated onto the coated organic material, an exposedportion of the coated organic material is altered so that the exposedportion of the coated organic material is removed through thedevelopment process. The reticle 300 includes a transparent substrate301 and opaque patterns 302 formed on the transparent substrate 301. Theopaque patterns 302 are comprised of an opaque material such as chrome(Cr), chrome oxide, etc.

In this embodiment, the portion of the coated organic materialcorresponding to the portion of the second electrode 213 and the portionof the transmission region Ta are opened, and the remaining portion ofthe transmission region Ta corresponding to the partition wall 223 isblocked by the reticle 300. Alternatively, the portion of the coatedorganic material corresponding to the portion of the second electrode213 and the portion of the transmission region Ta may be blocked, andthe remaining portion of the transmission region Ta corresponding to thepartition wall 223 may be exposed through the reticle 300.

The reticle 300 has a pattern for the partition wall 223 so that thepartition wall 223 is formed from the same layer as the insulating layer221. The transmission region Ta of the insulating layer 221 is recessedwhen compared to the reflection region Ra of the insulating layer 221.The pattern for the partition wall 223 may be an opaque portion, a slit,or a translucent portion so that a height of the partition wall 223 isno more than a thickness of the insulating layer 221 of the reflectionregion Ra. In this embodiment, the pattern for the partition wall 223has the slit so that the height of the partition wall 223 is less thanthe thickness of the insulating layer 221 of the reflection region Ra,and the partition wall 223 has an inclined surface with respect to abottom surface of the first plate 201.

An embossed pattern for the embossed portion is formed on the insulatinglayer 221 through the photo process and a heating process that isperformed after the development process.

Referring to FIG. 3C, the second pixel electrode part 225 is formed onthe insulating layer 221 corresponding to the reflection region Ra sothat the second pixel electrode part 225 is electrically connected tothe first pixel electrode part 219 and the second electrode 213.

The insulating layer 221 corresponding to the transmission region Ta isremoved so that the liquid crystal layer (not shown) of the transmissionregion Ta has different thickness from the liquid crystal layer (notshown) of the reflection region Ra. The insulating layer correspondingto the transmission region may be partially or completely removed. Inthis embodiment, a thickness of the liquid crystal layer (not shown) ofthe reflection region Ra is twice of a thickness of the liquid crystallayer (not shown) of the transmission region Ta so that a light that haspassed through the liquid crystal layer (not shown) of the reflectionregion Ra has substantially equal path length to a light that has passedthrough the liquid crystal layer (not shown) of the transmission regionTa. Therefore, the reflection region Ra has substantially equal opticalcharacteristics to the transmission region Ta. Alternatively, thethickness of the liquid crystal layer (not shown) of the reflectionregion Ra may be adjusted so that the optical characteristics of thereflection region Ra may be optimized, and the thickness of the liquidcrystal layer (not shown) of the transmission region Ta may bedetermined by the thickness of the liquid crystal layer (not shown) ofthe reflection region Ra and the thickness of the insulating layer 221.

A method of manufacturing the lower substrate of FIG. 2B is same as inFIG. 2A except that the first pixel electrode part 219 is formed afterthe insulating layer 221 is formed. That is, the first pixel electrodepart 219 of FIG. 2B is formed on the insulating layer 221. An opaquematerial such as aluminum, aluminum alloy, etc., is deposited on thefirst pixel electrode part 219, and the deposited opaque material isthen partially removed to form the second pixel electrode part 225. Analloy layer that has molybdenum-tungsten may be between the first andsecond pixel electrode parts 219 and 225.

FIGS. 4A, 4B, and 4C are plan views showing display apparatuses inaccordance with other embodiments of the present invention.

A common electrode of an upper substrate of the display apparatusincludes a pattern 402 having various shapes such as a circular shape,an elliptical shape, a polygonal shape, etc. Alternatively, the commonelectrode may have a plurality of the patterns 402. When a transmissionregion Ta is divided into a plurality of transmission portions, thecommon electrode has the patterns 402 that correspond to thetransmission patterns 402. The common electrode may also have variouspatterns 402. In this embodiment, each of the patterns 402 is on acentral portion of each of the transmission portions. The commonelectrode is partially removed to form the patterns 402.

A cross-sectional view of a lower substrate of each of the displayapparatuses of FIGS. 4A to 4C may be substantially the same as in FIG.1A. Alternatively, the cross-sectional view of a lower substrate of eachof the display apparatuses of FIGS. 4A to 4C may be substantially thesame as in FIG. 1B. A liquid crystal layer (not shown) is between theupper substrate and the lower substrate. The liquid crystal layer (notshown) may include a vertical alignment (VA) mode, a reverse twistednematic (RTN) mode, etc.

The display apparatus may include a light source, a light guide plate,optical sheets, a polarizer, and a retardation film. The light guideplate guides a light generated from the light source into the lowersubstrate. The light source, the light guide plate, the optical sheets,the polarizer, and the retardation film are under the lower substrate.The retardation film delays a phase of a light that passes through theretardation film by about λ/4. An upper retardation film and an upperpolarizer may be on the upper substrate. In this embodiment, the displayapparatus has a normally black mode using the retardation films, theliquid crystal layer, and the polarizers. When voltage is not applied tothe common electrode, a first electrode part, and/or a second electrodepart, the light may not pass through the display apparatus so that thedisplay apparatus displays black. Alternatively, the display apparatushas a normally white mode. When the voltage is not applied to the commonelectrode, a first electrode part, and/or a second electrode part, thelight may pass through the display apparatus so that the displayapparatus displays white. Alternatively, a protrusion (not shown) may beformed on the central portion of each of the transmission portions.

FIG. 5A is a cross-sectional view taken along the line III-III′ shown inFIG. 4A. Referring to FIG. 5A, a lower substrate 501 does not have anypartition wall 223 such as that shown in FIG. 2A. An organic insulatingmaterial is coated on a passivation layer 217 and a first pixelelectrode part 219, and the coated organic insulating materialcorresponding to a portion of a second electrode 213 and a transmissionregion Ta is removed to form an insulating layer 221. Alternatively, thefirst pixel electrode part 219 may be on the insulating layer 221 (asshown in FIG. 5C). An upper substrate 505 corresponding to the lowersubstrate 501 may further include a color filter (not shown) and acommon electrode 507 that is on the surface of the upper substrate 505.The common electrode 507 has a pattern 402 corresponding to thetransmission region Ta of the lower substrate 501. The pattern 402 hasthe elliptical shape that is extended in a longitudinal direction withrespect to the transmission region Ta (as shown in FIG. 4A).Alternatively, the pattern 402 may have the polygonal shape, thecircular shape, etc. (as shown in FIGS. 4B and 4C). Alternatively, thecommon electrode 507 may not have the pattern 402, but a protrusion (notshown) may be formed on the common electrode 507 corresponding to thecentral portion of the transmission region Ta.

The common electrode 507 of the display apparatus shown in FIG. 5A hasthe pattern 402 so that an alignment of a liquid crystal layer 508 ischanged to form a multi-domain in the liquid crystal layer 508, therebyimproving an image display quality of the display apparatus.

FIG. 5B is a cross-sectional view taken along the line IV-IV′ shown inFIG. 4B. FIG. 5C is a cross-sectional view taken along the line V-V′shown in FIG. 4C. Lower substrates of FIGS. 5B and 5C are substantiallythe same as in FIGS. 2A and 2B. In addition, upper substrates and commonelectrodes of FIGS. 5B and 5C are substantially the same as in FIG. 5Aexcept for shape and number of patterns. Thus, the same referencenumerals will be used to refer to the same or like parts as thosedescribed in FIGS. 2A, 2B, and 5A and further explanation will beomitted.

Referring to FIGS. 5B and 5C, the common electrode 507 has the patterns402 corresponding to transmission portions. In this embodiment, each ofthe patterns 402 of the common electrode 507 is spaced apart frompartition wall 223, and corresponds to a central portion of each of thetransmission portions. A transmission region is divided into a pluralityof the transmission portions by the partition wall 223. Each of thepatterns 402 has an elliptical shape, a polygonal shape, a circularshape, etc. Alternatively, a plurality of the patterns may correspond toeach of the transmission portions. Alternatively, the common electrode507 may not have the patterns 402, but a plurality of protrusions (notshown) may be on the common electrode 507 corresponding to the centralportion of each of the transmission portions.

The bottom substrate of each of the display apparatuses shown in FIGS.5B and 5C includes the partition wall 223, a stepped portion between thetransmission region and a reflection region, and an embossed portion inthe reflection region so that liquid crystal molecules of a liquidcrystal layer 508 are inclined by a predetermined angle. In addition,the common electrode 507 has the patterns 402 so that an alignment ofthe liquid crystal layer 508 is altered. Furthermore, locations of thepartition wall 223 and the patterns 402 are optimized so that the liquidcrystal layer 508 may be easily controlled to improve an image displayquality of the display apparatus. Also, the display apparatus may bemanufactured without a rubbing process so that a yield of the displayapparatus is increased while the manufacturing cost of the displayapparatus is decreased.

FIG. 6 is a plan view showing an LCD apparatus in accordance with anembodiment of the present invention. FIG. 7 is a cross-sectional viewtaken along the line VI-VI′ shown in FIG. 6. FIG. 8 is a cross-sectionalview taken along the line VII-VII′ shown in FIG. 6.

Referring to FIGS. 6 to 8, the LCD apparatus includes an upper substrate1170, a lower substrate 1180, and a liquid crystal layer 1108.

The upper substrate 1170 includes a second plate 1100, a black matrix1102, a color filter 1104, a common electrode 1106, a spacer 1110, and arecess 1130 a for a multi-domain. The upper substrate 1170 may include aplurality of color filters, a plurality of spacers, and a plurality ofrecesses for the multi-domain. The upper substrate 1170 includes adisplay region 1150 in which an image is displayed and a peripheralregion 1155 that surrounds the display region 1150. The upper substrate1170 may include a plurality of the display regions 1150.

The lower substrate 1180 includes a first plate 1120, a thin filmtransistor 1119, a source line 1118 a′, a gate line 1118 b′, a gateinsulating layer 1126, a passivation layer 1116, a storage capacitor(not shown), an organic layer 1114, a first pixel electrode part 1112, asecond pixel electrode part 1113, and a protrusion 1131 a for themulti-domain. The lower substrate 1180 may include a plurality of thethin film transistors 1119, a plurality of source lines 1118 a′, aplurality of gate lines 1118 b′, a plurality of storage capacitors, aplurality of first pixel electrode parts 1112, a plurality of secondpixel electrode parts 1113, and a plurality of protrusions 1131 a forthe multi-domain. The liquid crystal layer 1108 is between the uppersubstrate 1170 and the lower substrate 1180.

The lower substrate 1180 includes a pixel region 1140 and a blockingregion 1145 in which a light is blocked. The pixel region 1140corresponds to the display region 1150, and the blocking region 1145corresponds to the peripheral region 1155. The pixel region 1140includes a transmission window 1129 a through which a light generatedfrom a backlight assembly (not shown) passes and a reflection region1128 from which a light that is provided from an exterior to the uppersubstrate 1170 is reflected. In this embodiment, the transmission window1129 a has a quadrangular shape.

In one example, the first and second plates 1100 and 1120 include atransparent glass through which light may pass. The first and secondplates 1100 and 1120 do not include alkaline ion in accordance with anembodiment of the present invention. Disadvantageously, if the first andsecond plates 1100 and 1120 include alkaline ions, the alkaline ions maybe dissolved in the liquid crystal layer 1108 to decrease a resistivityof the liquid crystal layer 1108, thereby decreasing an image displayquality and an adhesive strength between a sealant and the plates 1100and 1120. In addition, characteristics of the thin film transistor 1119may be deteriorated.

Alternatively, the first and second plates 1100 and 1120 may includetriacetylcellulose (TAC), polycarbonate (PC), polyethersulfone (PES),polyethyleneterephthalate (PET), polyethylenenaphthalate (PEN),polyvinylalcohol (PVA), polymethylmethacrylate (PMMA), cyclo-olefinpolymer (COP), etc.

The first and second plates 1100 and 1120 are optically isotropic.Alternatively, the first and second plates 1100 and 1120 may beoptically anisotropic.

The black matrix 1102 is in the peripheral region 1155 of the secondplate 1100 to block the light. The black matrix 1102 blocks the lightpassing through the blocking region 1145 to improve the image displayquality.

A metallic material or an opaque organic material is deposited on thesecond plate 1100 and etched to form the black matrix 1102. The metallicmaterial of the black matrix 1102 includes chrome (Cr), chrome oxide(CrOx), chrome nitride (CrNx), etc. The opaque organic material includescarbon black, a pigment compound, a colorant compound, etc. The pigmentcompound may include a red pigment, a green pigment, and a blue pigment,and the colorant compound may include a red colorant, a green colorant,and a blue colorant. Alternatively, the opaque organic materialcomprising photoresist may be coated on the second plate 1100 to formthe black matrix 1102 through a photo process on the coated photoresist.Edges of a plurality of the color filters may also be overlapped withone another to form the black matrix 1102.

The color filter 1104 is formed in the display region 1150 of the secondplate 1100 having the black matrix 1102 so that the light having apredetermined wavelength may pass through the color filter 1104. Thecolor filter 1104 includes a red color filter portion 1104 a, a greencolor filter portion 1104 b, and a blue color filter portion 1104 c. Thecolor filter 1104 includes a photo initiator, a monomer, a binder, apigment, a dispersant, a solvent, a photoresist, etc. The color filter1104 may be on the first plate 1120 or the passivation layer 1116.

The color filter 1104 has the recess 1130 a for the multi-domain so thatthe multi-domain is formed in the liquid crystal layer 1108. A portionof the color filter 1104 is removed to form the recess 1130 a for themulti-domain. The recess 1130 a for the multi-domain corresponds to thetransmission window 1129 a. In this embodiment, the recess 1130 a forthe multi-domain is formed on a central line of the transmission window1129 a, and the recess 1130 a for the multi-domain has a rectangularshape that is extended in a direction substantially parallel with thecentral line. A depth of the recess 1130 a for the multi-domain issubstantially equal to a thickness of the color filter 1104.Alternatively, the depth of the recess 1130 a may be less than thethickness of the color filter 1104.

The common electrode 1106 is formed over the second plate 1100 havingthe black matrix 1102 and the color filter 1104. The common electrode1106 includes a transparent conductive material, for example, indium tinoxide (ITO), indium zinc oxide (IZO), zinc oxide (ZO), etc.Alternatively, the common electrode 1106 may be formed to besubstantially parallel with the first pixel electrode part 1112 and thesecond pixel electrode part 1113.

The spacer 1110 is formed on the second plate 1100 having the blackmatrix 1102, the color filter 1104, and the common electrode 1106. Theupper substrate 1170 is spaced apart from the lower substrate 1180 bythe spacer 1110. In this embodiment, the spacer 1110 is at a positioncorresponding to the black matrix 1102, and has a column shape.Alternatively, the spacer 1110 may have a variety of shapes, includingbut not limited to a ball shaped spacer or a mixture of the columnshaped spacer and the ball shaped spacer.

The thin film transistor 1119 is in the reflection region 1128 of thefirst plate 1120, and includes a source electrode 1118 a, a gateelectrode 1118 b, a drain electrode 1118 c and a semiconductor layerpattern. A driving integrated circuit (not shown) applies a data voltageto the source electrode 1118 a through the source line 1118 a′, andapplies a gate signal to the gate electrode 1118 b through the gate line1118 b′.

The gate insulating layer 1126 is formed over the first plate 1120having the gate electrode 1118 b so that the gate electrode 1118 b iselectrically insulated from the source electrode 1118 a and the drainelectrode 1118 c. The gate insulating layer 1126 may include siliconoxide (SiOx), silicon nitride (SiNx), etc.

The passivation layer 1116 is over the first plate 1120 having the thinfilm transistor 1119. The passivation layer 1116 has a contact hole. Thedrain electrode 1118 c is partially exposed through the contact hole.The passivation layer 1116 may include silicon oxide, the siliconnitride, etc.

The storage capacitor (not shown) is formed on the first plate 1120 tomaintain a voltage difference between the second pixel electrode part1113 and the common electrode 1106 and a voltage difference between thefirst pixel electrode part 1112 and the common electrode 1106.

The organic layer 1114 is on the first plate 1120 having the thin filmtransistor 1119 and the passivation layer 1116 so that the thin filmtransistor 1119 is electrically insulated from the first pixel electrodepart 1112 and the second pixel electrode part 1113. The organic layer1114 has a contact hole through which the drain electrode 1118 c ispartially exposed.

The organic layer 1114 defines the transmission window 1129 a, and thetransmission window 1129 a is opened so that the lower substrate 1180corresponding to the reflection region 1128 has different height fromthe lower substrate 1180 corresponding to the transmission window 1129a. Alternatively, a portion of the organic layer 1114 may remain in thetransmission window 1129 a.

The organic layer 1114 includes a protruded portion 1115 and an embossedportion. The protruded portion 1115 corresponds to the spacer 1110 sothat an alignment of the liquid crystal layer 1108 is controlled. Theembossed portion is in the reflection region 1128 to improve areflectivity of the second pixel electrode part 1113.

The protrusion 1131 a for the multi-domain is formed on the passivationlayer 1116 corresponding to the recess 1130 a for the multi-domain. Theprotrusion 1131 a has a quadrangular shape that is extended in adirection that is substantially parallel with the source line 1118 a′.Alternatively, a plurality of the protrusions for the multi-domain maycorrespond to a single recess for the multi-domain. A plurality ofrecesses for the multi-domain may correspond to a single protrusion forthe multi-domain. In this embodiment, the protrusion 1131 a for themulti-domain is formed from the same layer as the organic layer 1114.

Sizes of the protrusion 1131 a and the recess 1130 a for themulti-domain are adjusted to control the alignment of the liquid crystallayer 1108.

The first pixel electrode part 1112 is formed on the organic layer 1114corresponding to the pixel region 1140, an inner surface of the contacthole, a protrusion 1131 a for the multi-domain, and the transmissionwindow 1129 a so that the first pixel electrode part 1112 iselectrically connected to the drain electrode 1118 c. When the voltageis applied to the first pixel electrode part 1112 and the commonelectrode 1106, the alignment of the liquid crystal layer 1108 iscontrolled so that a light transmittance of the liquid crystal layer1108 varies. The first pixel electrode part 1112 includes a transparentconductive material such as indium tin oxide (ITO), indium zinc oxide(IZO), zinc oxide (ZO), etc.

The second pixel electrode part 1113 is on the organic layer 1114corresponding to the reflection region 1128 so that the light isreflected from the second pixel electrode part 1113. In this embodiment,the second pixel electrode part 1113 is on the embossed portion so thatthe reflectivity viewed from a front of the LCD apparatus is increased.The second pixel electrode part 1113 includes a conductive material sothat the second pixel electrode part 1113 is electrically connected tothe drain electrode 1118 c through the first pixel electrode part 1112.

Alignment layers (not shown) may be on the upper substrate 1170 and thelower substrate 1180 so that the alignment of the liquid crystal layer1108 is controlled.

The liquid crystal layer 1108 is between the upper substrate 1170 andthe lower substrate 1180, and the liquid crystal layer 1108 is sealed bya sealant (not shown). The liquid crystal layer 1108 may have a verticalalignment (VA) mode, a twisted nematic (TN) mode, a mixed twistednematic (MTN) mode, a homogeneous alignment mode, etc. In thisembodiment, the liquid crystal layer 1108 has the VA mode.

When the voltage is applied to the first pixel electrode part 1112, thesecond pixel electrode part 1113 and the common electrode 1106, electricfields formed in regions adjacent to the protruded portion 1115, thespacer 1110, the stepped portion between the transmission window 1129 a,and the reflection region 1128, the recess 1130 a and the protrusion1131 a for the multi-domain are distorted. Therefore, the multi-domainis formed in the liquid crystal layer 1108 to increase the viewing angleof the LCD apparatus.

FIGS. 9A to 9K are cross-sectional views showing a method ofmanufacturing the LCD apparatus shown in FIG. 6.

Referring to FIG. 9A, the pixel region 1140 and the blocking 1145 aredefined on the first plate 1120. The pixel region 1140 includes thetransmission window 1129 a through which the light generated from thebacklight assembly (not shown) passes and the reflection region 1128from which the light that is provided from an exterior to the uppersubstrate 1170 (FIGS. 7 and 8) is reflected.

A conductive material is deposited on the first plate 1120. Thedeposited conductive material is partially removed to form the gateelectrode 1118 b and the gate line 1118 b′ (FIG. 6). The insulatingmaterial is deposited on the first plate 1120 to form the gateinsulating layer 1126.

An amorphous silicon pattern and an N+ amorphous silicon pattern areformed on the gate insulating layer 1126 corresponding to the gateelectrode 1118 b to form the semiconductor layer. A conductive materialis deposited on the gate insulating layer 1126 having the semiconductorlayer. The deposited conductive material is partially etched to form thesource electrode 1118 a, the source line 1118 a′, and the drainelectrode 1118 c. Therefore, the thin film transistor 1119 having thesource electrode 1118 a, the gate electrode 1118 b, the drain electrode1118 c, and the semiconductor layer is completed.

An insulating material is then deposited on the first plate 1120 havingthe thin film transistor 1119. In one embodiment, the insulatingmaterial includes a photoresist.

Referring to FIG. 9B, the organic material 1114′ is coated on theinsulating material.

Referring to FIG. 9C, the coated organic material 1114′ is exposedthrough a mask to form organic layer 1114. The exposed organic material1114′ is developed to form the contact hole, the protruded portion 1115,the embossed portion, and the protrusion 1131 a for the multi-domain. Inaddition, the coated organic material 1114′ corresponding to thetransmission window 1129 a is opened. In this embodiment, the coatedorganic material 1114′ is exposed using a single mask. Alternatively,the coated organic material may be exposed using a plurality of masks.The mask includes an opaque portion, translucent portions, andtransparent portions. The opaque portion corresponds to the protrudedportion 1115. The translucent portions correspond to the embossedportion and the protrusion 1131 a for the multi-domain. The transparentportions correspond to the contact hole and the transmission window 1129a. Alternatively, the translucent portions may include a plurality ofslits. A light transmittance of the translucent portion or widths of theslits are adjusted to control the size of the protrusion 1131 a for themulti-domain.

Referring to FIG. 9D, the transparent conductive material is depositedon the organic layer 1114, the passivation 1116, the inner surface ofthe contact hole, the transmission window 1129 a, and the protrusion1131 a for the multi-domain. The transparent conductive materialincludes ITO, IZO, ZO, etc. In this embodiment, the transparentconductive material includes ITO. The deposited transparent conductivematerial is partially etched to form the first pixel electrode part1112. The first pixel electrode part 1112 is in the pixel region 1140.

A conductive material having high reflectivity is deposited over thefirst plate 1120 including the first pixel electrode part 1112. In thisembodiment, the conductive material includes aluminum and neodymium. Thedeposited conductive material is partially etched to form the secondpixel electrode part 1113 in the reflection region 1128.

Alternatively, the second pixel electrode part 1113 may have amulti-layered structure. The second pixel electrode part 1113 may alsohave a molybdenum-tungsten alloy layer and an aluminum-neodymium alloyon the molybdenum-tungsten alloy layer. The second pixel electrode part1113 is electrically connected to the drain electrode 1118 c through thefirst pixel electrode part 1112 and the contact hole. Alternatively, thesecond pixel electrode part 1113 may be on the organic layer 1114 andthe inner surface of the contact hole, and the first electrode part 1112is on the transmission window 1129 a and a portion of the second pixelelectrode part 1113 so that the first pixel electrode part 1112 iselectrically connected to the drain electrode 1118 c through the secondpixel electrode part 1113.

Therefore, the lower substrate 1180 having the first plate 1120, thethin film transistor 1119, the source line 1118 a′, the gate line 1118b′, the organic layer 1114, the first pixel electrode part 1112, thesecond pixel electrode part 1113, and the protrusion 1131 a for themulti-domain is completed.

Referring to FIG. 9E, the metallic material is deposited on the secondplate 1100. The deposited metallic material is partially etched to formthe black matrix 1102. Alternatively, the opaque organic material may becoated on the second plate 1100, and the coated opaque organic materialmay be partially removed through photo process to form the black matrix1102. The photo process includes an exposure process and a developmentprocess. Alternatively, the black matrix 1102 may be formed on the firstplate 1120.

Referring to FIG. 9F, a mixture 1104 a′ of a red colorant andphotoresist is coated on the second plate 1100 having the black matrix1102.

Referring to FIG. 9G, the coated mixture 1104 a′ shown in FIG. 9F isexposed using a mask and developed to form the red color filter portion1104 a and the recess 1130 a for the multi-domain. The mask includes aslit corresponding to the recess 1130 a for the multi-domain. The sizeof the recess 1130 a for the multi-domain is determined by the size ofthe slit. Alternatively, the mask may include a translucent portion. Thesize of the recess 1130 a for the multi-domain may be determined by thesize of the translucent portion.

Referring to FIG. 9H, the green color filter portion 1104 b and the bluecolor filter portion 1104 c shown in FIG. 8 are formed on the secondplate 1100 having the black matrix 1102 and the red color filter portion1104 a.

Referring to FIG. 9I, the transparent conductive material is depositedon the second plate 1100 having the black matrix 1102 and the colorfilter 1104 to form the common electrode 1106.

Referring to FIG. 9J, an organic material is coated on the commonelectrode 1106. In this embodiment, the organic material includesphotoresist. The coated organic material is exposed and developed toform the spacer 1110 on the common electrode 1106 corresponding to theblack matrix 1102. Alternatively, the spacer 1110 may be formed on thefirst plate 1120.

Referring to FIG. 9K, the upper substrate 1170 is combined with thelower substrate 1180.

The liquid crystal layer 1108 is formed between the upper substrate 1170and the lower substrate 1180, and the liquid crystal layer 1108 issealed by a sealant (not shown). Liquid crystal may be dropped on theupper substrate 1170 having the sealant (not shown), and the lowersubstrate 1180 may be combined with the upper substrate 1170 to providethe liquid crystal layer 1108. Alternatively, the liquid crystal mayalso be dropped on the lower substrate 1180 having the sealant (notshown), and the upper substrate 1170 may be combined with the lowersubstrate 1180.

According to this embodiment, the alignment of the liquid crystal layer1108 in the regions adjacent to the protruded portion 1115, the spacer1110, the stepped portion between the transmission window 1129 a and thereflection region 1128, the recess 1130 a for the multi-domain, and theprotrusion 1131 a for the multi-domain are controlled to form themulti-domain in the transmission window 1129 a. The center of themulti-domain corresponds to the recess 1130 a for the multi-domain andthe protrusion 1131 a for the multi-domain.

FIG. 10 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention. FIG. 11 is a plan viewshowing a first pixel electrode part and a second pixel electrode partshown in FIG. 10. FIG. 12 is a cross-sectional view taken along the lineVIII-VIII′ shown in FIG. 10. FIG. 13 is a cross-sectional view takenalong the line IX-IX′ shown in FIG. 10.

The LCD apparatus of FIGS. 10 to 13 is substantially the same as theapparatus shown in FIGS. 6 to 8 except for an overcoating layer andorganic layer. Thus, the same reference numerals will be used to referto the same or like parts as those described in FIGS. 6 to 8 and furtherexplanation regarding similar parts will be omitted.

Referring to FIGS. 10 to 13, the LCD apparatus includes an uppersubstrate 1170, a lower substrate 1180, and a liquid crystal layer 1108.

The upper substrate 1170 includes a second plate 1100, a black matrix1102, a color filter 1104, an overcoating layer 1105, a common electrode1106, a spacer 1110, and a recess 1132 a for a multi-domain. The uppersubstrate 1170 may include a plurality of the color filters, a pluralityof the spacers, and a plurality of the recesses for the multi-domain.The upper substrate 1170 includes a display region 1150 and a peripheralregion 1155 that surrounds the display region 1150. The upper substrate1170 may include a plurality of the display regions.

The lower substrate 1180 includes a first plate 1120, a thin filmtransistor 1119, a source line 1118 a′, a gate line 1118 b′, a gateinsulating layer 1126, a passivation layer 1116, a storage capacitor(not shown), an organic layer 1114, a first pixel electrode part 1112, asecond pixel electrode part 1113, and a protrusion 1134 a for themulti-domain. The lower substrate 1180 may include a plurality of thethin film transistors, a plurality of the source lines, a plurality ofthe gate lines, a plurality of the storage capacitors, a plurality ofthe first pixel electrode parts, a plurality of the second pixelelectrode parts, and a plurality of the protrusions for themulti-domain. The liquid crystal layer 1108 is between the uppersubstrate 1170 and the lower substrate 1180.

The lower substrate 1180 includes a pixel region 1140 and a blockingregion 1145 in which a light is blocked. The pixel region 1140corresponds to the display region 1150, and the blocking region 1145corresponds to the peripheral region 1155. The pixel region 1140includes a transmission window 1129 a through which a light generatedfrom a backlight assembly (not shown) passes and a reflection region1128 on which a light that is provided from an exterior is reflected tothe upper substrate 1170.

The black matrix 1102 is in the peripheral region 1155 of the secondplate 1100 to block the light.

The color filter 1104 is formed in the display region 1150 of the secondplate 1100 having the black matrix 1102 so that the light having apredetermined wavelength may pass through the color filter 1104. Thecolor filter 1104 includes a red color filter portion 1104 a, a greencolor filter portion 1104 b, and a blue color filter portion 1104 c.

The color filter 1104 includes the recess 1132 a for the multi-domain sothat the multi-domain is formed in the liquid crystal layer 1108. Aportion of the color filter 1104 is removed to form the recess 1132 afor the multi-domain. The recess 1132 a for the multi-domain correspondsto the transmission window 1129 a. In this embodiment, the recess 1132 afor the multi-domain is on a central line of the transmission window1129 a, and the recess 1132 a for the multi-domain has a rectangularshape that is extended in a direction substantially parallel with thecentral line. A depth of the recess 1132 a for the multi-domain issubstantially equal to a thickness of the color filter 1104.Alternatively, the depth of the recess 1132 a may be less than thethickness of the color filter 1104.

The overcoating layer 1105 is on the second plate 1100 having the blackmatrix 1102 and the color filter 1104 to protect the black matrix 1102and the color filter 1104 from an impact that is provided from anexterior to the upper substrate 1170. Also, the overcoating layer 1105planarizes a surface of the upper substrate 1170.

The overcoating layer 1105 corresponding to the transmission window 1129a is opened so that the upper substrate 1170 corresponding to thetransmission window 1129 a has different height from the upper substrate1170 corresponding to the reflection region 1128. Alternatively, anembossed portion may be formed on the overcoating layer 1105corresponding to the reflection region 1128.

A portion of the overcoating layer 1105 may remain on the color filter1104 and the recess 1132 a for the multi-domain corresponding to thetransmission window 1129 a. The remaining overcoating layer 1105 may bealong the color filter 1104 and the recess 1132 a for the multi-domain.

The common electrode 1106 is formed on the second plate 1100 having theblack matrix 1102, the color filter 1104, and the overcoating layer1105.

The spacer 1110 is formed over the second plate 1100 having the blackmatrix 1102, the color filter 1104, the overcoating layer 1105, and thecommon electrode 1106. In one example, the spacer 1110 includes thecolumn spacer on the common electrode 1106 corresponding to the blackmatrix 1102.

The thin film transistor 1119 is formed in the reflection region 1128 ofthe first plate 1120. The thin film transistor 1119 includes a sourceelectrode 1118 a, a gate electrode 1118 b, a drain electrode 1118 c, anda semiconductor layer pattern.

The gate insulating layer 1126 is on the first plate 1120 having thegate electrode 1118 b so that the gate electrode 1118 b is electricallyinsulated from the source electrode 1118 a and the drain electrode 1118c.

The passivation layer 1116 is over the first plate 1120 having the thinfilm transistor 1119. The passivation layer 1116 includes a contact holethrough which the drain electrode 1118 c is partially exposed.

The organic layer 1114 is over the first plate 1120 having the thin filmtransistor 1119 and the passivation layer 1116. The thin film transistor1119 is electrically insulated from the first pixel electrode part 1112and the second pixel electrode part 1113. The organic layer 1114includes a contact hole through which the drain electrode 1118 c ispartially exposed.

The organic layer 1114 further includes a protruded portion 1115, anembossed portion, and a protrusion 1134 a for the multi-domain.

The protruded portion 1115 corresponds to the spacer 1110 so that anarrangement of the liquid crystal layer 1108 adjacent to the protrudedportion 1115 is controlled. The embossed portion is in the reflectionregion 1128 to improve a reflectivity of the second pixel electrode part1113.

The protrusion 1134 a for the multi-domain is on the organic layer 1114corresponding to the recess 1132 a for the multi-domain. The protrusion1134 a for the multi-domain has a quadrangular shape that is extended ina direction that is substantially parallel with the source line 1118 a′.In this embodiment, the protrusion 1134 a for the multi-domain is formedfrom the same layer as the organic layer 1114.

The first pixel electrode part 1112 is formed on the organic layer 1114corresponding to the pixel region 1140, an inner surface of the contacthole, and a protrusion 1134 a for the multi-domain so that the firstpixel electrode part 1112 is electrically connected to the drainelectrode 1118 c.

The second pixel electrode part 1113 is on the organic layer 1114corresponding to the reflection region 1128 so that the light isreflected from the second pixel electrode part 1113.

The liquid crystal layer 1108 is between the upper substrate 1170 andthe lower substrate 1180, and the liquid crystal layer 1108 is sealed bya sealant (not shown). In this embodiment, the liquid crystal layer 1108has the VA mode.

When the voltage is applied to the first pixel electrode part 1112, thesecond pixel electrode part 1113, and the common electrode 1106,electric fields formed in regions adjacent to the protruded portion1115, the spacer 1110, the stepped portion between the overcoating layer1105 and the color filter 1104, the recess 1132 a for the multi-domain,and the protrusion 1132 a for the multi-domain are distorted. Therefore,the multi-domain is formed in the liquid crystal layer 1108 to increasethe viewing angle of the LCD apparatus.

FIGS. 14A to 14J are cross-sectional views showing a method ofmanufacturing the LCD apparatus shown in FIG. 10.

Referring to FIG. 14A, the thin film transistor 1119 is formed on thefirst plate 1120. A transparent insulating material is deposited on thefirst plate 1120 having the thin film transistor 1119. An organicmaterial 1114′ is coated on the deposited transparent insulatingmaterial. In this embodiment, the organic material includes photoresist.

Referring to FIG. 14B, the coated organic material 1114′ is exposedthrough a mask to form an organic layer 1114. The exposed organicmaterial 1114′ is developed to form the contact hole, the protrudedportion 1115, the embossed portion, and the protrusion 1134 a for themulti-domain. In this embodiment, the coated organic material 1114′ isexposed using a single mask. Alternatively, the coated organic materialmay be exposed using a plurality of masks. The mask includes atransparent portion, opaque portions, and a translucent portion. Thetransparent portion corresponds to the contact hole. The opaque portionscorrespond to the protruded portion 1115 and the protrusion 1134 a forthe multi-domain. The translucent portion corresponds to the embossedportion. Therefore, a height difference of the organic layer 1114 isdecreased so that a manufacturing process of the LCD apparatus issimplified. Alternatively, the translucent portions may include aplurality of slits.

Referring to FIG. 14C, the first pixel electrode part 1112 is formed inthe pixel region 1140 of the first plate 1120 having the organic layer1114. The second pixel electrode part 1113 is formed in the reflectionregion of the first plate 1120 having the first pixel electrode part1112.

Therefore, the lower substrate 1180 having the first plate 1120, thethin film transistor 1119, the source line 1118 a′, the gate line 1118b′ shown in FIG. 10, the organic layer 1114, the first pixel electrodepart 1112, the second pixel electrode part 1113, and the protrusion 1134a for the multi-domain is completed.

Referring to FIG. 14D, the black matrix 1102 is formed on the secondplate 1100. A mixture 1104 a′ of a red colorant and photoresist iscoated on the second plate 1100 having the black matrix 1102.

Referring to FIG. 14E, the coated mixture 1104 a′ is exposed through themask and developed to form the red color filter portion 1104 a and therecess 1132 a for the multi-domain.

Referring to FIG. 14F, the green color filter portion 1104 b and theblue color filter portion (not shown) are formed on the second plate1100 having the black matrix 1102 and the red color filter portion 1104a.

Referring to FIG. 14G, the organic material 1105′ having the photoresistis coated over the second plate 1100 having the black matrix 1102 andthe color filter 1104.

Referring to FIG. 14H, the coated organic material 1105′ is exposedthrough the mask and developed to form overcoating layer 1105 so thatthe color filter 1104 corresponding to the transmission window 1129 a ofthe lower substrate 1180 and the recess 1132 a for the multi-domain areopened.

Referring to FIG. 14I, a transparent conductive material is depositedover the second plate 1100 having the black matrix 1102, the colorfilter 1104, and the overcoating layer 1105 to form the common electrode1106.

Referring to FIG. 14J, the spacer 1110 is formed on the common electrode1106 corresponding to the black matrix 1102, and the upper substrate1170 is combined with the lower substrate 1180. The liquid crystal layer1108 is interposed between the upper substrate 1170 and the lowersubstrate 1180. The liquid crystal layer 1108 is sealed by the sealant(not shown).

According to this embodiment, when the voltage is applied to the commonelectrode 1106, the first pixel electrode 1112, and the second pixelelectrode part 1113, the multi-domain is formed in the regions adjacentto the protruded portion 1115, the spacer 1110, the stepped portionbetween the overcoating layer 1105 and the color filter 1104, the recess1132 a for the multi-domain, and the protrusion 1134 a for themulti-domain.

In addition, the liquid crystal layer 1108 of the transmission window1129 a has different thickness from the liquid crystal layer 1108 of thereflection region 1128 by the overcoating layer 1105 so that the heightdifference of the organic layer 1114 is decreased so that the protrusion1134 a for the multi-domain may be easily formed.

FIG. 15 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention. FIG. 16 is across-sectional view taken along the line X-X′ shown in FIG. 15.

The LCD apparatus of FIGS. 15 and 16 is substantially the same as theapparatus shown in FIGS. 10 to 13 except for a recess for a multi-domainand a protrusion for the multi-domain. Thus, the same reference numeralswill be used to refer to the same or like parts as those described inFIGS. 10 to 13 and further explanation will be omitted.

Referring to FIGS. 15 to 16, the LCD apparatus includes an uppersubstrate 1170, a lower substrate 1180, and a liquid crystal layer 1108in between the substrates.

The upper substrate 1170 includes a second plate 1100, a black matrix1102, a color filter 1104, an overcoating layer 1105, a common electrode1106, a spacer 1110, and two recesses 1132 b for a multi-domain. Theupper substrate 1170 may include a plurality of the color filters, aplurality of the spacers, and a plurality of the recesses for themulti-domain. The upper substrate 1170 includes a display region 1150and a peripheral region 1155 that surrounds the display region 1150. Theupper substrate 1170 may include a plurality of the display regions.

The lower substrate 1180 includes a first plate 1120, a thin filmtransistor 1119, a source line 1118 a′, a gate line 1118 b′, a gateinsulating layer 1126, a passivation layer 1116, a storage capacitor(not shown), an organic layer 1114, a first pixel electrode part 1112, asecond pixel electrode part 1113, and two protrusions 1134 b for themulti-domain. The lower substrate 1180 may include a plurality of thethin film transistors, a plurality of the source lines, a plurality ofthe gate lines, a plurality of the storage capacitors, a plurality ofthe first pixel electrode parts, a plurality of the second pixelelectrode parts, and a plurality of the protrusions for themulti-domain.

The liquid crystal layer 1108 is between the upper substrate 1170 andthe lower substrate 1180.

The lower substrate 1180 includes a pixel region 1140 and a blockingregion 1145 in which a light is blocked. The pixel region 1140corresponds to the display region 1150, and the blocking region 1145corresponds to the peripheral region 1155. The pixel region 1140includes a transmission window 1129 a through which a light generatedfrom a backlight assembly (not shown) passes and a reflection region1128 on which a light that is provided from an exterior is reflected tothe upper substrate 1170.

The color filter 1104 is formed in the display region 1150 of the secondplate 1100 having the black matrix 1102 so that the light having apredetermined wavelength may pass through the color filter 1104. Thecolor filter 1104 includes a red color filter portion 1104 a, a greencolor filter portion 1104 b, and a blue color filter portion.

The color filter 1104 includes the recesses 1132 b for the multi-domainso that the multi-domain is formed in the liquid crystal layer 1108. Aportion of the color filter 1104 is removed to form the recesses 1132 bfor the multi-domain. The recesses 1132 b for the multi-domaincorrespond to the transmission window 1129 a. In this embodiment, therecesses 1132 b for the multi-domain are on a central line of thetransmission window 1129 a, and in an example the recesses 1132 b forthe multi-domain have a rectangular shape that is extended in adirection substantially parallel with the central line. Alternatively,the recesses 1132 b for the multi-domain may be extended in a directionsubstantially parallel with the source line 1118 a′.

The overcoating layer 1105 is on the second plate 1100 having the blackmatrix 1102 and the color filter 1104.

The overcoating layer 1105 corresponding to the transmission window 1129a is opened so that the upper substrate 1170 of the transmission window1129 a has different height from the upper substrate 1170 of thereflection region 1128.

The organic layer is formed on the first plate 1120 having the thin filmtransistor 1119 and the passivation layer 1116 so that the thin filmtransistor 1119 is electrically insulated from the first and secondpixel electrode parts 1112 and 1113. The organic layer 1114 includes acontact hole through which a drain electrode 1118 c of the thin filmtransistor 1119 is partially exposed.

The organic layer 1114 further includes a protruded portion 1115, anembossed portion, and two protrusions 1134 b for the multi-domain.

Each of the protrusions 1134 b for the multi-domain is on the organiclayer 1114 corresponding to each of the recesses 1132 b for themulti-domain. In this embodiment, each of the protrusions 1134 b for themulti-domain has a rectangular shape. Alternatively, each of theprotrusions for the multi-domain may have a variety of shapes, includinga quadrangular shape in one example. In this embodiment, the protrusions1134 b for the multi-domain are formed from the same layer as theorganic layer 1114.

When voltage is applied to the first pixel electrode part 1112, thesecond pixel electrode part 1113, and the common electrode 1106, aplurality of domains is formed in regions adjacent to the recesses 1132b for the multi-domain and the protrusions 1132 b for the multi-domain.Therefore, the number of domains in the multi-domain is increased sothat the viewing angle of the LCD apparatus is increased.

FIG. 17 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention. FIG. 18 is a plan viewshowing a first pixel electrode part and a second pixel electrode partshown in FIG. 17. FIG. 19 is a cross-sectional view taken along the lineXI-XI′ shown in FIG. 17.

The LCD apparatus of FIGS. 17 to 19 is substantially the same as theapparatus shown in FIGS. 15 and 16 except for the first and second pixelelectrode parts. Thus, the same reference numerals will be used to referto the same or like parts as those described in FIGS. 15 and 16 andfurther explanation will be omitted.

Referring to FIGS. 17 to 19, the LCD apparatus includes an uppersubstrate 1170, a lower substrate 1180, and a liquid crystal layer 1108in between the substrates.

The upper substrate 1170 includes a second plate 1100, a black matrix1102, a color filter 1104, an overcoating layer 1105, a common electrode1106, a spacer 1110, and two recesses 1132 c for a multi-domain. Theupper substrate 1170 may include a plurality of the color filters, aplurality of the spacers, and a plurality of the recesses for themulti-domain. The upper substrate 1170 includes a display region 1150and a peripheral region 1155 that surrounds the display region 1150. Theupper substrate 1170 may include a plurality of the display regions.

The lower substrate 1180 includes a first plate 1120, a thin filmtransistor 1119, a source line 1118 a′, a gate line 1118 b′, a gateinsulating layer 1126, a passivation layer 1116, a storage capacitor(not shown), an organic layer 1114, a first pixel electrode part 1220, asecond pixel electrode part 1230, and two protrusions 1134 c for themulti-domain. The lower substrate 1180 may include a plurality of thethin film transistors, a plurality of the source lines, a plurality ofthe gate lines, a plurality of the storage capacitors, a plurality ofthe first pixel electrode parts, a plurality of the second pixelelectrode parts, and a plurality of the protrusions for themulti-domain. The liquid crystal layer 1108 is between the uppersubstrate 1170 and the lower substrate 1180.

The lower substrate 1180 includes a pixel region 1140 and a blockingregion 1145 in which a light is blocked. The pixel region 1140corresponds to the display region 1150, and the blocking region 1145corresponds to the peripheral region 1155. The pixel region 1140includes a transmission window 1129 a through which a light generatedfrom a backlight assembly (not shown) passes and a reflection region1128 on which a light that is provided from an exterior is reflected tothe upper substrate 1170.

The color filter 1104 includes the recesses 1132 c for the multi-domainso that the multi-domain is formed in the liquid crystal layer 1108.Portions of the color filter 1104 are removed to form the recesses 1132c for the multi-domain. The recesses 1132 c for the multi-domaincorrespond to the transmission window 1129 a. In this embodiment, therecesses 1132 c for the multi-domain are on a central line of thetransmission window 1129 a, and each of the recesses 1132 c for themulti-domain has a rectangular shape in one example.

The organic layer 1114 is on the first plate 1120 having the thin filmtransistor 1119 and the passivation layer 1116. The organic layer 1114includes a protruded portion 1115, an embossed portion, the protrusions1134 c for the multi-domain, and a contact hole through which the drainelectrode 1118 c is partially exposed. Each of the protrusions 1134 cfor the multi-domain is on the organic layer 1114 corresponding to eachof the recesses 1132 c for the multi-domain.

The first pixel electrode part 1112 includes a first transparentelectrode portion 1212 a, a second transparent electrode portion 1212 b,a first connecting portion 1136 a, and a second connecting portion 1136b.

The first and second transparent electrode portions 1212 a and 1212 bare on the organic layer 1114 corresponding to the transmission window1129 a. The second transparent electrode portion 1212 b is adjacent tothe first transparent electrode portion 1212 a.

The first connecting portion 1136 a is between the first and secondtransparent portions 1212 a and 1212 b to connect the first transparentelectrode portion 1212 a to the second transparent electrode portion1212 b. In this embodiment, each of the first and second transparentelectrode portions 1212 a and 1212 b has a rectangular shape.

The second connecting portion 1136 b is adjacent to the secondtransparent electrode portion 1212 b opposite the first connectingportion 1136 a to connect the second transparent electrode portion 1136b to the second pixel electrode part 1230. Alternatively, a portion ofthe second transparent electrode portion 1136 b is extended into thecontact hole to electrically connect the second transparent electrodeportion 1136 b to the drain electrode 1118 c of the thin film transistor1119.

The second pixel electrode part 1230 is on the organic layer 1114corresponding to the reflection region 1128. The second pixel electrodepart 1230 has a rectangular shape in one example.

Alternatively, each of the first transparent electrode part 1212 a, thesecond transparent electrode part 1212 b, and the second pixel electrodepart 1230 may have a variety of shapes including but not limited to apolygonal shape, and a circular shape. The polygonal shape may include aquadrangular shape, a hexagonal shape, and an octagonal shape, to name afew.

An interval between the first and second transparent electrode portions1212 a and 1212 b and an interval between the second transparentelectrode portion 1212 b and the second pixel electrode part 1230 areadjusted to control an alignment of a liquid crystal of the liquidcrystal layer 1108.

The liquid crystal layer 1108 is between the upper substrate 1170 andthe lower substrate 1180. In this embodiment, the liquid crystal layer1108 has a VA mode.

When voltage is applied to the first pixel electrode part 1220 and thecommon electrode 1106, a plurality of domains is formed in regionsadjacent to the recesses 1132 c for the multi-domain and the protrusions1134 c for the multi-domain.

In addition, electric fields formed between the first and secondtransparent electrode portions 1212 a and 1212 b and between the secondtransparent electrode portion 1212 b and the second pixel electrode part1230 are distorted. Therefore, an alignment of the liquid crystal of theliquid crystal layer 1108 is controlled so that a viewing angle of theLCD apparatus is increased.

FIG. 20 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention. FIG. 21 is across-sectional view taken along the line XII-XII′ shown in FIG. 20.

The LCD apparatus of FIGS. 20 and 21 is substantially the same as thestructure shown in FIGS. 17 to 19 except for a second recess for amulti-domain. Thus, the same reference numerals will be used to refer tothe same or like parts as those described in FIGS. 17 to 19 and furtherexplanation will be omitted.

Referring to FIGS. 20 and 21, the LCD apparatus includes an uppersubstrate 1170, a lower substrate 1180, and a liquid crystal layer 1108in between the substrates.

The upper substrate 1170 includes a second plate 1100, a black matrix1102, a color filter 1104, an overcoating layer 1105, a common electrode1106, a spacer 1110, two first recesses 1132 d for a multi-domain and asecond recess 1137 for the multi-domain. The upper substrate 1170 mayinclude a plurality of the color filters, a plurality of the spacers, aplurality of the first recesses for the multi-domain, and a plurality ofthe second recesses for the multi-domain. The upper substrate 1170includes a display region 1150 and a peripheral region 1155 thatsurrounds the display region 1150. The upper substrate 1170 may includea plurality of the display regions.

The lower substrate 1180 includes a first plate 1120, a thin filmtransistor 1119, a source line 1118 a′, a gate line 1118 b′, a gateinsulating layer 1126, a passivation layer 1116, a storage capacitor(not shown), an organic layer 1114, a first pixel electrode part 1220, asecond pixel electrode part 1230, and two protrusions 1134 d for themulti-domain. The lower substrate 1180 may include a plurality of thethin film transistors, a plurality of the source lines, a plurality ofthe gate lines, a plurality of the storage capacitors, a plurality ofthe first pixel electrode parts, a plurality of the second pixelelectrode parts, and a plurality of the protrusions for themulti-domain. The liquid crystal layer 1108 is between the uppersubstrate 1170 and the lower substrate 1180.

The lower substrate 1180 includes a pixel region 1140 and a blockingregion 1145 in which a light is blocked. The pixel region 1140corresponds to the display region 1150, and the blocking region 1145corresponds to the peripheral region 1155. The pixel region 1140includes a transmission window 1129 a through which a light generatedfrom a backlight assembly (not shown) passes and a reflection region1128 on which a light that is provided from an exterior is reflected tothe upper substrate 1170.

The overcoating layer 1105 corresponding to the transmission window 1129a is opened so that the upper substrate 1170 of the transmission window1129 a has different thickness from the upper substrate 1170 of thereflection region 1128.

The second recess 1137 for the multi-domain is on the overcoating 1105corresponding to the reflection region 1128 of the lower substrate 1180.

The protrusions 1134 d for the multi-domain are on the organic layer1114 corresponding to the first recesses 1132 d for the multi-domain.

When voltage is applied to the second pixel electrode part 1230 and thecommon electrode 1106, an electric field formed adjacent to the secondrecess 1137 for the multi-domain is distorted. Therefore, an alignmentof liquid crystals of the liquid crystal layer 1108 adjacent to thesecond pixel electrode part 1230 is controlled to form a plurality ofdomains in the reflection region 1128.

FIG. 22 is a plan view showing an LCD apparatus in accordance withanother embodiment of the present invention. FIG. 23 is across-sectional view taken along the line XIII-XIII′ shown in FIG. 22.

The LCD apparatus of FIGS. 22 and 23 is substantially the same as theapparatus shown in FIGS. 20 to 21 except for the first and secondrecesses for a multi-domain. Thus, the same reference numerals will beused to refer to the same or like parts as those described in FIGS. 20to 21 and further explanation will be omitted.

Referring to FIGS. 22 and 23, the LCD apparatus includes an uppersubstrate 1170, a lower substrate 1180, and a liquid crystal layer 1108.

The upper substrate 1170 includes a second plate 1100, a black matrix1102, a color filter 1104, an overcoating layer 1105, a common electrode1106, a spacer 1110, two first recesses 1132 e for a multi-domain, and asecond recess 1138 for the multi-domain. The upper substrate 1170 mayinclude a plurality of the color filters, a plurality of the spacers, aplurality of the first recesses for the multi-domain and a plurality ofthe second recesses for the multi-domain. The upper substrate 1170includes a display region 1150 and a peripheral region 1155 thatsurrounds the display region 1150. The upper substrate 1170 may includea plurality of the display regions.

The lower substrate 1180 includes a first plate 1120, a thin filmtransistor 1119, a source line 1118 a′, a gate line 1118 b′, a gateinsulating layer 1126, a passivation layer 1116, a storage capacitor(not shown), an organic layer 1114, a first pixel electrode part 1220, asecond pixel electrode part 1230, and two protrusions 1134 e for themulti-domain. The lower substrate 1180 may include a plurality of thethin film transistors, a plurality of the source lines, a plurality ofthe gate lines, a plurality of the storage capacitors, a plurality ofthe first pixel electrode parts, a plurality of the second pixelelectrode parts, and a plurality of the protrusions for themulti-domain. The liquid crystal layer 1108 is between the uppersubstrate 1170 and the lower substrate 1180.

The lower substrate 1180 includes a pixel region 1140 and a blockingregion 1145 in which a light is blocked. The pixel region 1140corresponds to the display region 1150, and the blocking region 1145corresponds to the peripheral region 1155. The pixel region 1140includes a transmission window 1129 a through which a light generatedfrom a backlight assembly (not shown) passes and a reflection region1128 on which a light that is provided from an exterior is reflected tothe upper substrate 1170.

The color filter 1104 includes the recesses 1132 e for the multi-domainso that the multi-domain is formed in the liquid crystal layer 1108.Portions of the color filter 1104 are removed to form the recesses 1132e for the multi-domain. A depth of each of the recesses 1132 e for themulti-domain may be less than a thickness of the color filter 1104.

The second recess 1138 for the multi-domain is on the overcoating 1105corresponding to the reflection region 1128 of the lower substrate 1180.In this embodiment, the second recess 1138 for the multi-domain hassubstantially equal size to each of the first recesses 1132 e.

The protrusions 1134 e for the multi-domain are on the organic layer1114 corresponding to the first recesses 1132 e for the multi-domain.

According to this embodiment, sizes of the first and second recesses1132 e and 1138 for the multi-domain are adjusted to control analignment of liquid crystals of the liquid crystal layer 1108. Accordingto the present invention, the display apparatus includes a liquidcrystal layer having a vertical alignment (VA) mode and the multi-domainso that the image display quality of the display apparatus is improved.The liquid crystal layer having the VA mode may be inclined by apredetermined pretilt angle. In addition, the display apparatus may bemanufactured without a rubbing process.

In particular, the liquid crystal layer includes the recess andprotrusion for the multi-domain so that the multi-domain is formed inthe liquid crystal layer, thereby improving the viewing angle of the LCDapparatus. In addition, the electric fields formed between the first andsecond transparent electrode portions and between the second transparentelectrode portion and the second pixel electrode part are distorted sothat the alignment of the liquid crystals of the liquid crystal layer iscontrolled, thereby improving the viewing angle of the LCD apparatus.Further, the manufacturing process of the display apparatus issimplified so that the manufacturing cost of the display apparatus isdecreased.

This invention has been described above with reference to theembodiments. It is evident, however, that many alternative modificationsand variations will be apparent to those having skill in the art inlight of the foregoing description. Accordingly, the present inventionembraces all such alternative modifications and variations as fallwithin the spirit and scope of the appended claims.

What is claimed is:
 1. A display panel comprising: a lower substrateincluding a transmission region and a reflection region; a switchingelement disposed on the lower substrate; a transmission electrodeelectrically connected to the switching element, the transmissionelectrode disposed in the transmission region; a reflection electrodeelectrically connected to the switching element, the reflectionelectrode disposed in the reflection region; an upper substrate facingthe lower substrate; a color filter formed on the upper substrate; aliquid crystal layer disposed between the lower substrate and the uppersubstrate; a first domain forming member disposed on the lowersubstrate; and a second domain forming member including an openingformed through the color filter and facing the first domain formingmember, wherein the first domain forming member and the second domainforming member are disposed in an area corresponding to the transmissionregion, and are not disposed in an area corresponding to the reflectionregion.
 2. The display panel of claim 1, wherein the first domainforming member includes a protrusion formed on the lower substrate. 3.The display panel of claim 2, wherein the protrusion is formed on thetransmission electrode and divides the transmission electrode of thetransmission region into a plurality of transmission portions.
 4. Thedisplay panel of claim 3, wherein the second domain forming memberfurther includes a recess formed on the upper substrate and disposed ata center of each of the transmission portions.
 5. The display panel ofclaim 1, wherein the protrusion is extended to reach a boundary of thetransmission region so that the transmission portions are completelyisolated from each other.
 6. The display panel of claim 1, wherein thedisplay panel further comprises an insulating layer formed on the lowersubstrate to cover the switching element and formed in the reflectionregion.
 7. The display panel of claim 6, wherein the insulating layer isremoved in the transmission region, and the first domain forming memberincludes same material as the insulating layer.
 8. The display panel ofclaim 6, wherein the first domain forming member includes a protrusionformed on the transmission electrode and the protrusion is formed fromthe same layer as the insulation layer.
 9. The display panel of claim 8,wherein a height of the protrusion is no more than a thickness of theinsulating layer of the reflection region.
 10. The display panel ofclaim 1, wherein a depth of the opening is substantially equal to athickness of the color filter.
 11. The display panel of claim 1, whereinthe first domain forming member includes a protrusion formed on thelower substrate and a recess formed on the upper substrate correspondingthe protrusion.
 12. The display panel of claim 1, wherein the reflectionelectrode is formed on the transmission electrode.
 13. The display panelof claim 12, wherein the transmission electrode is electricallyconnected to the switching element through the reflection electrode. 14.A method of manufacturing a display panel comprising: forming aswitching element on a lower substrate including a transmission regionthrough which a light may pass and a reflection region from which alight may be reflected; forming an insulating layer on the lowersubstrate having the switching element formed thereon; patterning theinsulating layer to form a protrusion that divides the transmissionregion into a plurality of transmission portions; forming a transmissionelectrode on the protrusion to be electrically connected to theswitching element; and forming a color filter on an upper substrate; andremoving a portion of the color filter to form an opening facing theprotrusion; wherein the protrusion is disposed in an area correspondingto the transmission region, and is not disposed in an area correspondingto the reflection region.
 15. The method of claim 14, furthercomprising: disposing the upper substrate having the color filter withthe opening over the lower substrate having the transmission electrodesuch that the opening of the color filter is disposed at a center ofeach of the transmission portions; and combining the upper plate suchthat a liquid crystal layer is disposed between the lower substrate andthe upper substrate.
 16. The method of claim 14, wherein the protrusionis extended to reach a boundary of the transmission region so that thetransmission portions are completely isolated from each other.
 17. Themethod of claim 14, wherein a height of the protrusion is no more than athickness of the insulating layer of the reflection region.
 18. Themethod of claim 14, wherein said patterning the insulating layer to formthe protrusion is patterning the insulating layer to remove theinsulating layer of the transmission region except for a regioncorresponding to the protrusion.